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A Brief Review on Thin Film Deposition and Characterization Techniques
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| Author:
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P.MOHAN BABU, N.NAGARAJU, S.KONDAL RAO, SK.ERFAN, B.VENKATESWARLU, MD.HUSSAIN BASHA, R.MADHUSUDHAN
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| Abstract:
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The growing electronic industry needs to adopt new thin technologies for the sake of miniaturization of electronic devices. The performance of the miniaturized thin film-based electronic components depends on various factors such as chemical stability during the deposition (growth parameters), atomic structure, and morphology, optical and electronic properties. Hence choosing a suitable deposition technique plays a crucial role in deciding the performance of thin film-based devices. In addition, various characterization techniques have to be carried out on the prepared thin films to check their quality, and applicability to a specific application. Here in this brief review, we have discussed various thin film deposition techniques such as thermal evaporation, sputtering, electronic beam evaporation, spray pyrolysis etc. We have adopted a few of the aforementioned thin film deposition techniques for our research samples (ZnO, MoO3, and TiO2 – MoO3 thin films) that have been mentioned as examples while elaborating on a particular technique. A few of the thin film characterization techniques have also been discussed.
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| Keyword:
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Thin Film Deposition, Characterization Techniques, Flash Evaporation.
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| EOI:
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-
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| DOI:
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https://doi.org/10.31838/ijpr/2019.11.01.307
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| Download:
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